2 June 2014 Stack of PECVD silicon nitride nano-films on optical fiber end-face for refractive index sensing
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Proceedings Volume 9157, 23rd International Conference on Optical Fibre Sensors; 91575F (2014) https://doi.org/10.1117/12.2059770
Event: OFS2014 23rd International Conference on Optical Fiber Sensors, 2014, Santander, Spain
Abstract
This paper presents a stack of silicon nitride (SiNx) nano-films deposited with radio-frequency plasma-enhanced chemical deposition (RF PECVD) method on single-mode fiber end-face for refractive index (RI) sensing. The stack consist of high (n~2.4) and low (n~1.9) refractive index (at λ=1550 nm) SiNx nano-films arranged alternately. As a result of the experiment where 5 nano-layers were deposited, we received down to -30 dB-deep resonance in reflection spectrum at about λ=1550 nm. In the proposed sensing scheme both reflected power and wavelength of the resonance can be used for external RI measurements.
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Mateusz Śmietana, Mateusz Śmietana, Marcin Koba, Marcin Koba, Radoslaw Różycki-Bakon, Radoslaw Różycki-Bakon, } "Stack of PECVD silicon nitride nano-films on optical fiber end-face for refractive index sensing", Proc. SPIE 9157, 23rd International Conference on Optical Fibre Sensors, 91575F (2 June 2014); doi: 10.1117/12.2059770; https://doi.org/10.1117/12.2059770
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