28 August 2014 Nanoimprint fabrication of wiregrids micro-polarizers in near infrared spectra using SU-8 as an intermediate film
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Abstract
In this paper, we demonstrate a wiregrid polarizer for the near-IR spectrum fabricated by nanoimprint techniques. High resolution grating structures with 215nm in linewidth, 375nm pitch and 235nm total height were patterned on silicon by deep-UV interference lithography followed by reactive ion etching. The grating structures were transferred to a SU-8 thin film by nanoimprint. Then a glancing angle deposition was performed to build the wiregrids. The extinction ratio was measured to be over 90:1 at 1064nm.
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Junxin Wang, Junxin Wang, Andrew M. Sarangan, Andrew M. Sarangan, } "Nanoimprint fabrication of wiregrids micro-polarizers in near infrared spectra using SU-8 as an intermediate film", Proc. SPIE 9170, Nanoengineering: Fabrication, Properties, Optics, and Devices XI, 917010 (28 August 2014); doi: 10.1117/12.2061230; https://doi.org/10.1117/12.2061230
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