25 September 2014 Chromatic error correction of diffractive optical elements at minimum etch depths
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Abstract
The integration of diffractive optical elements (DOE) into an optical design opens up new possibilities for applications in sensing and illumination. If the resulting optics is used in a larger spectral range we must correct not only the chromatic error of the conventional, refractive, part of the design but also of the DOE. We present a simple but effective strategy to select substrates which allow the minimum etch depths for the DOEs. The selection depends on both the refractive index and the dispersion.
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Jochen Barth, Jochen Barth, Tobias Gühne, Tobias Gühne, } "Chromatic error correction of diffractive optical elements at minimum etch depths", Proc. SPIE 9192, Current Developments in Lens Design and Optical Engineering XV, 91920J (25 September 2014); doi: 10.1117/12.2061000; https://doi.org/10.1117/12.2061000
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