25 September 2014 Employment of fluorescence for autofocusing in direct laser writing micro-/nano-lithography
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Abstract
Herein we present the implementation of autofocusing in multi-photon Direct Laser Writing (DLW) lithography. It is based on fluorescence occurring within the confined volume of a photopolymer/photoresin excitation resulting to a voxel generation. The proposed method is further successfully employed for the nanofabrication of large scale (500 nm in height, up to 25 mm2 in area) Diffractive Optical Elements (DOE). The produced structures are characterized using Scanning Electron Microscope (SEM) and confocal optical profilometry. The introduced technique is potential for a simple, price and effort efficient upgrade of currently existing DLW micro-/nano-lithography setups.
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Mangirdas Malinauskas, Mangirdas Malinauskas, Albertas Žukauskas, Albertas Žukauskas, Kastytis Belazaras, Kastytis Belazaras, } "Employment of fluorescence for autofocusing in direct laser writing micro-/nano-lithography", Proc. SPIE 9192, Current Developments in Lens Design and Optical Engineering XV, 919212 (25 September 2014); doi: 10.1117/12.2061261; https://doi.org/10.1117/12.2061261
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