Three-dimensional photothermal microscopy of KDP crystals

Jian Chen; Jingtao Dong; Qi Zhang; Zhouling Wu

doi:10.1117/12.2062528

18 August 2014 Three-dimensional photothermal microscopy of KDP crystals

Jian Chen, Jingtao Dong, Qi Zhang, Zhouling Wu

Proceedings Volume 9203, Interferometry XVII: Techniques and Analysis; 92030W (2014) https://doi.org/10.1117/12.2062528
Event: SPIE Optical Engineering + Applications, 2014, San Diego, California, United States

Abstract

The laser damage threshold of KDP crystals is one major limitation in many high-power laser systems. Investigation of laser damage behavior of KDP crystals shows that the major reason for laser damage is the growth defects in the bulk of the materials. Therefore, an effective diagnostic method for those defects is quite necessary for producing KDP crystals with high enough damage threshold to meet the requirement of high power laser applications. In this paper, we reported the characterization of bulk defects in KDP crystals using a three dimensional photothermal microscope based on a laserinduced photothermal lensing technique. Several 3D mapping of the bulk defects were obtained. The results indicated that both surface defects and bulk defects can be determined and analyzed using the 3-D photothermal microscope. The details of the development of the 3-D photothermal microscope were also presented. The system provided user-friendly operations of the defects characterization process and showed great potential of application for characterization of low absorption optical materials.

Citation Download Citation

Jian Chen, Jingtao Dong, Qi Zhang, and Zhouling Wu "Three-dimensional photothermal microscopy of KDP crystals", Proc. SPIE 9203, Interferometry XVII: Techniques and Analysis, 92030W (18 August 2014); https://doi.org/10.1117/12.2062528

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