18 August 2014 Measure of a zinc oxide (ZnO) film thickness using a point diffraction interferometer
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Abstract
The use of zinc oxide (ZnO) for its application as gas sensor is frequent in the industry. One important element for the characterization of this kind of structure is the measurement of the material thickness deposited on a substrate. In this work, an optical method for determining the measure of the ZnO material thickness, in this case a point diffraction interferometer (PDI) is used. The PDI uses few optical elements in the arrangement and its low cost represents an easy implementation. Also, the ZnO sample does not require any chemical treatment to be measure; consequently it does not need an extra step in the measurement process. The purpose of this arrangement is to implement it as a measuring tool for the laboratory of sensor films of the Autonomous University of the State of Hidalgo. For early results, it is proposed to measure the thickness of a ZnO film larger than one micron of the ZnO film, and the results are compared with the traditional method using a talkstep.
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Esteban Rueda-Soriano, Heberto Gómez-Pozos, José L. González-Vidal, A. Muñoz Potosi, Luis G. Valdivieso-González, "Measure of a zinc oxide (ZnO) film thickness using a point diffraction interferometer", Proc. SPIE 9203, Interferometry XVII: Techniques and Analysis, 920317 (18 August 2014); doi: 10.1117/12.2062098; https://doi.org/10.1117/12.2062098
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