5 September 2014 A reflectometer for at-wavelength characterization of XUV-reflection gratings
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Abstract
Within our technology center for production of highly efficient precision gratings a versatile 4-circle UHV-reflectometer for synchrotron radiation based at-wavelength characterization has been fabricated. The main feature is the possibility to incorporate real live-sized gratings. The samples are adjustable within six degrees of freedom by a novel UHV-tripod system, and the reflectivity can be measured at all incidence angles for both s- and p-polarization geometry. The reflectometer has been setup in a clean room hutch and it is coupled permanently to the optics beamline PM-1 for the UV and XUV range with the polarization adjustable to either linear or elliptical. The setup will be open to users by the end of 2014.
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F. Eggenstein, P. Bischoff, A. Gaupp, F. Senf, A. Sokolov, T. Zeschke, F. Schäfers, "A reflectometer for at-wavelength characterization of XUV-reflection gratings", Proc. SPIE 9206, Advances in Metrology for X-Ray and EUV Optics V, 920607 (5 September 2014); doi: 10.1117/12.2061828; https://doi.org/10.1117/12.2061828
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