5 September 2014 Low-energy repetitive plasma focus based neon soft x-ray lithography source
Author Affiliations +
Abstract
Fast miniature plasma focus (FMPF-3), a low energy (235 J) device, is an attractive option for being a potential source for soft X-ray (SXR) (0.9 – 1.6 keV) lithography due to its smaller X-ray generation spot size and the capability of being a high repetition source. As a continuation of our work on the enhancement of SXR emission from this device, in present investigation the insulator sleeve length is optimized for efficient SXR emission. It plays a major role in the current sheath formation, which is determinant of the efficient compression and the consequent radiation emission. The influence of the presence or absence of cathode rods on the SXR emission is also investigated. It is one least explored parameter although it plays a major role in the determination of plasma sheath curvature which in turn influences the dynamic plasma inductance and the magnetic flux associated with moving current sheath. Another major highlight of this study is the time resolved laser shadowgraphy of the plasma sheath dynamics to understand the influence of the variation of these parameters on it. Through optimization of the insulator sleeve length, the highest ever obtained SXR yield of 1.8 J/shot was achieved for this device.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. M. P. Kalaiselvi, T. L. Tan, A. Talebitaher, P. Lee, R. S. Rawat, "Low-energy repetitive plasma focus based neon soft x-ray lithography source", Proc. SPIE 9207, Advances in X-Ray/EUV Optics and Components IX, 92070P (5 September 2014); doi: 10.1117/12.2062549; https://doi.org/10.1117/12.2062549
PROCEEDINGS
12 PAGES


SHARE
RELATED CONTENT

Vacuum spark discharge soft x-ray source
Proceedings of SPIE (December 06 2001)
The Plasma Focus As Soft X Ray Source For Microscopy...
Proceedings of SPIE (November 27 1989)
Micropinch x-ray source and its applications
Proceedings of SPIE (November 02 2000)
High-repetition-rate x-ray preionization source
Proceedings of SPIE (February 01 1991)
Prospects Of A Plasma Focus Device As An Intense X...
Proceedings of SPIE (July 28 1981)

Back to Top