Defect Detection And Classification Using The Euler Number

Soo-Ik Chae; James T. Walker; Chong-Cheng Fu; R. Fabian Pease

doi:10.1117/12.968391

1 January 1988 Defect Detection And Classification Using The Euler Number

Soo-Ik Chae, James T. Walker, Chong-Cheng Fu, R. Fabian Pease

Proceedings Volume 0921, Integrated Circuit Metrology, Inspection, and Process Control II; (1988) https://doi.org/10.1117/12.968391
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

A new approach to defect detection and classification in VLSI circuit pattern inspection is described, which employs the Euler number of a local image as a feature. Defect classification rules represented with the sum and diffierence of two Euler numbers for a local image and its complement are derived, and additional rules to eliminate false detections from acceptable edge roughness are introduced. Simulation results for real image data are also presented.

Citation Download Citation

Soo-Ik Chae, James T. Walker, Chong-Cheng Fu, and R. Fabian Pease "Defect Detection And Classification Using The Euler Number", Proc. SPIE 0921, Integrated Circuit Metrology, Inspection, and Process Control II, (1 January 1988); https://doi.org/10.1117/12.968391

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