Displacement Measurement Repeatability In Tens Of Nanometers With Laser Interferometry

Charles R Steinmetz

doi:10.1117/12.968389

1 January 1988 Displacement Measurement Repeatability In Tens Of Nanometers With Laser Interferometry

Charles R Steinmetz

Proceedings Volume 0921, Integrated Circuit Metrology, Inspection, and Process Control II; (1988) https://doi.org/10.1117/12.968389
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

Recent advancements in Hewlett-Packard laser interferometers has made it possible to achieve displacement measurements with a repeatability in the tens of nanometers. This will be of key importance in achieving the submicron geometries in future integrated circuits. This measurement repeatability is achieved by the use of two new products that significantly reduce the major error components of the interferometer system. Before discussing the details of these products, an account is given on how to analyze the measurement repeatability of a laser interferometer system. Each component of the system repeatability budget are discussed. From this analysis it is observed that the most significant error components in this budget are due to atmospheric affects and the thermal drift of the optics. The affects of these errors have been reduced on the Hewlett-Packard system by the use of Wavelength Tracking Compensation and a new high stability interferometer.

Citation Download Citation

Charles R Steinmetz "Displacement Measurement Repeatability In Tens Of Nanometers With Laser Interferometry", Proc. SPIE 0921, Integrated Circuit Metrology, Inspection, and Process Control II, (1 January 1988); https://doi.org/10.1117/12.968389

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