Recent Results From A High Thruput, In-Line Metrology SEM

Karl L Harris; Sakae Miyauchi; Takao Namae

doi:10.1117/12.968349

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1 January 1988 Recent Results From A High Thruput, In-Line Metrology SEM

Karl L Harris, Sakae Miyauchi, Takao Namae

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Proceedings Volume 0921, Integrated Circuit Metrology, Inspection, and Process Control II; (1988) https://doi.org/10.1117/12.968349
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

The KLA/Holon 2711 is an electron beam based system, using a thermal field emission source, specifically designed for the IC metrology application. Systems such as this are increasingly used in IC production due to decreasing line widths.[1] Accuracy is the major reason to use high resolution e-beam technology for metrology. The system is the first to have a complete keyboard interface which allows for easy and fast operation. Thruput and reliability data are presented. Important column and measurement parameters were optimized to get the best precision and the results are reported. Data is presented which shows the system to be accurate in both its ability to correlate to a cross section standard ("absolute accuracy") and to track the bottom width of a resist feature ("relative accuracy"). (This is a results orientated paper. For a more complete system description please refer to the paper presented last year at this conference by the same authors.)

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Karl L Harris, Sakae Miyauchi, and Takao Namae "Recent Results From A High Thruput, In-Line Metrology SEM", Proc. SPIE 0921, Integrated Circuit Metrology, Inspection, and Process Control II, (1 January 1988); https://doi.org/10.1117/12.968349

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