Stepper Lens Characterization Using A Field Emission SEM

Mike Tipton; Marylyn Hoy Bennett; Jim Pollard; Jack Smith; Ricky Jackson

doi:10.1117/12.968352

1 January 1988 Stepper Lens Characterization Using A Field Emission SEM

Mike Tipton, Marylyn Hoy Bennett, Jim Pollard, Jack Smith, Ricky Jackson

Proceedings Volume 0921, Integrated Circuit Metrology, Inspection, and Process Control II; (1988) https://doi.org/10.1117/12.968352
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

A method of stepper lens evaluation has been developed which utilizes a simple resolution test pattern of the type usually supplied with the stepper. Measurements are made using an automated field emission SEM equipped to perform whole wafer non-destructive critical dimension analysis. Measurement data on focus and sizing is then analyzed by a computer program easily run on a small personal computer. Information on reticle sizing errors and wafer flatness may also be included in the analysis to minimize errors.

Citation Download Citation

Mike Tipton, Marylyn Hoy Bennett, Jim Pollard, Jack Smith, and Ricky Jackson "Stepper Lens Characterization Using A Field Emission SEM", Proc. SPIE 0921, Integrated Circuit Metrology, Inspection, and Process Control II, (1 January 1988); https://doi.org/10.1117/12.968352

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