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1 January 1988 Masks For Sub - 0.5µm Optical Lithography
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A significant departure from traditional ways of viewing mask quality will be necessary in order to have a viable mask manufacturing technology for sub - 0.5um optical lithography. It will be necessary to evaluate mask performance in the context of the overall IC manufacturing process. This paper will look at the limitations of present state-of-the-art mask specifications and suggest that a new approach to mask verification is needed. Instead of making apriori and somewhat arbitrary decisions about what masks need to look like, we must have a method of determining which mask errors are of concern and which are not. Ultimately, we can exploit our mask technology to compensate for errors created by our IC manufacturing process.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Steve K Dunbrack "Masks For Sub - 0.5µm Optical Lithography", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988);

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