18 September 2014 Germanium devices for integrated photonic circuits
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Abstract
World-wide interest in germanium-on-silicon photonics has grown enormously during the past few years. We report on our study of germanium deposition for which we found that there is potential to engineer films with significant increases in hole mobility. In addition, we report on our development of wet-etch techniques to pattern thin films and to form tapered regions of Ge, both important for the fabrication of Ge photonic devices.
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F. Kenneth Hopkins, F. Kenneth Hopkins, Alexander Benken, Alexander Benken, Kevin M. Walsh, Kevin M. Walsh, John Jones, John Jones, Kent Averett, Kent Averett, } "Germanium devices for integrated photonic circuits", Proc. SPIE 9226, Nanophotonics and Macrophotonics for Space Environments VIII, 92260I (18 September 2014); doi: 10.1117/12.2061080; https://doi.org/10.1117/12.2061080
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