Design Of A New, Two Lens Ion Gun For Micromachining

Jon Orloff; John Whitney

doi:10.1117/12.945641

14 June 1988 Design Of A New, Two Lens Ion Gun For Micromachining

Jon Orloff, John Whitney

Proceedings Volume 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII; (1988) https://doi.org/10.1117/12.945641
Event: Medical Imaging II, 1988, Newport Beach, CA, United States

Abstract

A two lens, 25 keV electrostatic ion gun has been constructed which uses a liquid metal ion source and which is capable of high resolution (50 nanometers) and high current density in the focused spot (J > 3 A/cm2) at reasonable working distances (25 mm). Variable current is achieved by using a variable aperture between the lenses. The high performance is a result of optimizing the state of focus for the lenses for each aperture angle. The effect of a beam crossover between the lenses has been calculated and a crossover system performance is compared with collimated and optimized systems. While the best performance can be achieved by optimization, good performance can be achieved with a crossover if the crossover position is properly chosen.

Citation Download Citation

Jon Orloff and John Whitney "Design Of A New, Two Lens Ion Gun For Micromachining", Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); https://doi.org/10.1117/12.945641

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