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Black border, mask 3D effects: covering challenges of EUV mask architecture for 22nm node and beyond
Multi-stencil character projection e-beam lithography: a fast and flexible way for high quality optical metamaterials
Integration of e-beam direct write in BEOL processes of 28nm SRAM technology node using mix and match
Compact model experimental validation for grapho-epitaxy hole processes and its impact in mask making tolerances
Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy
Challenges and opportunities in applying grapho-epitaxy DSA lithography to metal cut and contact/via applications