17 October 2014 Writing time estimation of EB mask writer EBM-9000 for hp16nm/logic11nm node generation
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Proceedings Volume 9231, 30th European Mask and Lithography Conference; 923107 (2014) https://doi.org/10.1117/12.2065544
Event: 30th European Mask and Lithography Conference, 2014, Dresden, Germany
The scaling of semiconductor devices is slowing down because of the difficulty in establishing their functionality at the nano-size level and also because of the limitations in fabrications, mainly the delay of EUV lithography. While multigate devices (FinFET) are currently the main driver for scalability, other types of devices, such as 3D devices, are being realized to relax the scaling of the node. In lithography, double or multiple patterning using ArF immersion scanners is still a realistic solution offered for the hp16nm node fabrication. Other lithography candidates are those called NGL (Next Generation Lithography), such as DSA (Directed-Self-Assembling) or nanoimprint. In such situations, shot count for mask making by electron beam writers will not increase. Except for some layers, it is not increasing as previously predicted. On the other hand, there is another aspect that increases writing time. The exposure dose for mask writing is getting higher to meet tighter specifications of CD uniformity, in other words, reduce LER. To satisfy these requirements, a new electron beam mask writer, EBM-9000, has been developed for hp16nm/logic11nm generation. Electron optical system, which has the immersion lens system, was evolved from EBM-8000 to achieve higher current density of 800A/cm2. In this paper, recent shot count and dose trend are discussed. Also, writing time is estimated for the requirements in EBM-9000.
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Takashi Kamikubo, Takashi Kamikubo, Hidekazu Takekoshi, Hidekazu Takekoshi, Munehiro Ogasawara, Munehiro Ogasawara, Hirokazu Yamada, Hirokazu Yamada, Kiyoshi Hattori, Kiyoshi Hattori, "Writing time estimation of EB mask writer EBM-9000 for hp16nm/logic11nm node generation ", Proc. SPIE 9231, 30th European Mask and Lithography Conference, 923107 (17 October 2014); doi: 10.1117/12.2065544; https://doi.org/10.1117/12.2065544

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