21 August 2014 A novel optical method for measuring the thin film stress
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Proceedings Volume 9233, International Symposium on Photonics and Optoelectronics 2014; 92331V (2014) https://doi.org/10.1117/12.2069833
Event: International Symposium on Photonics and Optoelectronics (SOPO 2014), 2014, Suzhou, China
Abstract
This paper proposes a thin-film stress measurement system. By applying a constant velocity to the projection grating along the grating plane, a series of sampling points of the sinusoidal wave can be recorded using a CCD camera. The phase distribution of the optimized heterodyne moiré signal can be extracted by the least-squares sine fitting algorithm and then the surface profile of the tested flexible substrate can subsequently be acquired. Using polynomial fitting method to depict the cross-section curve of the substrate, estimating the resultant curvature radii of the uncoated and coated substrates, and substituting these two radii into the corrected Stoney formula, the thin-film stress of the flexible substrate can consequently be obtained. This method features high stability and high resolution due to the introduction of the projection moiré and heterodyne interferometry.
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Yen-Chang Chu, Kun-Huang Chen, Jing-Heng Chen, Hua-Ken Tseng, Yu-Shiang Chang, "A novel optical method for measuring the thin film stress", Proc. SPIE 9233, International Symposium on Photonics and Optoelectronics 2014, 92331V (21 August 2014); doi: 10.1117/12.2069833; https://doi.org/10.1117/12.2069833
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