2 June 2014 Nanostructure patterning on flexible substrates using electron beam lithography
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Proceedings Volume 9234, International Conference on Experimental Mechanics 2013 and Twelfth Asian Conference on Experimental Mechanics; 923415 (2014) https://doi.org/10.1117/12.2054259
Event: International Conference on Experimental Mechanics 2013 and the Twelfth Asian Conference on Experimental Mechanics, 2013, Bangkok, Thailand
Abstract
Patterning nanostructures on flexible substrates plays a key role in the emerging flexible electronics technology. The flexible electronic devices are inexpensive and can be conformed to any shape. The potential applications for such devices are sensors, displays, solar cells, RFID, high-density biochips, optoelectronics etc. E-beam lithography is established as a powerful tool for nanoscale fabrication, but its applicability on insulating flexible substrates is often limited because of surface charging effects. This paper presents the fabrication of nanostructures on insulating flexible substrates using low energy E-beam lithography along with metallic layers for charge dissipation. Nano Structures are patterned on different substrates of materials such as acetate and PET foils. The fabrication process parameters such as the proximity gap of exposure, the exposure dosage and developing conditions have been optimized for each substrate.
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K. S. Nagaraj, K. S. Nagaraj, K. Sangeeth, K. Sangeeth, G. M. Hegde, G. M. Hegde, } "Nanostructure patterning on flexible substrates using electron beam lithography", Proc. SPIE 9234, International Conference on Experimental Mechanics 2013 and Twelfth Asian Conference on Experimental Mechanics, 923415 (2 June 2014); doi: 10.1117/12.2054259; https://doi.org/10.1117/12.2054259
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