Translator Disclaimer
29 October 2014 Photonic curvilinear data processing
Author Affiliations +
Abstract
With more and more photonic data presence in e-beam lithography, the need for efficient and accurate data fracturing is required to meet acceptable manufacturing cycle time. Large photonic based layouts now create high shot count patterns for VSB based tools. Multiple angles, sweeping curves, and non-orthogonal data create a challenge for today’s e-beam tools that are more efficient on Manhattan style data. This paper describes techniques developed and used for creating fractured data for VSB based pattern generators. Proximity Effect Correction is also applied during the fracture process, taking into account variable shot sizes to apply for accuracy and design style. Choosing different fracture routines for pattern data on-the-fly allows for fast and efficient processing. Data interpretation is essential for processing curvilinear data as to its size, angle, and complexity. Fracturing complex angled data into "efficient" shot counts is no longer practical as shot creation now requires knowledge of the actual data content as seen in photonic based pattern data. Simulation and physical printing results prove the implementations for accuracy and write times compared to traditional VSB writing strategies on photonic data. Geometry tolerance is used as part of the fracturing algorithm for controlling edge placement accuracy and tuning to different e-beam processing parameters.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Clyde Browning, Thomas Quaglio, Thiago Figueiro, Sébastien Pauliac, Jérôme Belledent, Aurélien Fay, Jessy Bustos, Jean-Christophe Marusic, and Patrick Schiavone "Photonic curvilinear data processing", Proc. SPIE 9235, Photomask Technology 2014, 92350V (29 October 2014); https://doi.org/10.1117/12.2069335
PROCEEDINGS
10 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

Curvilinear data processing methods and verification
Proceedings of SPIE (September 19 2018)
DUV laser lithography for photomask fabrication
Proceedings of SPIE (May 28 2004)
Computational process optimization of array edges
Proceedings of SPIE (March 13 2012)
High-accuracy simulation-based optical proximity correction
Proceedings of SPIE (December 17 2003)
DUV laser lithography for photomask fabrication
Proceedings of SPIE (December 17 2003)

Back to Top