8 October 2014 A reusable framework for data-mining mask shop tools
Author Affiliations +
Abstract
Implementations of the Semiconductor Equipment Communications Standard (SECS) are uneven across mask shop tool sets, which often implement only tool control functionality and ignore data collection. Furthermore, data collection, if implemented at all, typically exposes only a fraction of the information available within log files created by the tool. This leaves a veritable wealth of information languishing unused in tool log files – data that could provide key insights toward improvements in tool performance, processes and utilization. This paper discusses a reusable, lightweight framework for mining data from mask shop tool log files. It details the categories of data that can be mined using this framework, as well as different actions that can be triggered based on the data. The paper also proposes a generic log file format that mask shop tool vendors can implement on any tool to facilitate tool troubleshooting and simplify automated data collection.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dan Meier, Dan Meier, "A reusable framework for data-mining mask shop tools", Proc. SPIE 9235, Photomask Technology 2014, 92351G (8 October 2014); doi: 10.1117/12.2065574; https://doi.org/10.1117/12.2065574
PROCEEDINGS
31 PAGES


SHARE
RELATED CONTENT

Evaluation of mask data preparation with OASIS and P10
Proceedings of SPIE (June 27 2005)
Mask cycle time reduction for foundry projects
Proceedings of SPIE (September 27 2011)
Mask industry assessment: 2006
Proceedings of SPIE (October 19 2006)
Effective placement of chips on a shuttle mask
Proceedings of SPIE (August 27 2003)
Mask industry assessment: 2005
Proceedings of SPIE (November 04 2005)
Mask industry assessment: 2004
Proceedings of SPIE (December 05 2004)

Back to Top