23 October 2014 Front Matter: Volume 9236
Proceedings Volume 9236, Scanning Microscopies 2014; 923601 (2014) https://doi.org/10.1117/12.2086290
Event: SPIE Scanning Microscopies, 2014, Monterey, California, United States
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 9236 including the Title Page, Copyright information, Table of Contents, Introduction, and Conference Committee listing.
Postek, Newbury, Platek, and Maugel: Front Matter: Volume 9236

The papers included in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. The papers published in these proceedings reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon.

Please use the following format to cite material from this book:

Author(s), “Title of Paper,” in Scanning Microscopies 2014, edited by Michael T. Postek, Dale E. Newbury, S. Frank Platek, Tim K. Maugel, Proceedings of SPIE Vol. 9236 (SPIE, Bellingham, WA, 2014) Article CID Number.

ISSN: 0277-786X

ISBN: 9781628412994

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Authors

Numbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

  • Bekaert, Joost, 18

  • Biafore, John J., 18

  • Bian, Haiyi, 0X

  • Blok, Mikel, 0Q

  • Boetsch, Guillaume, 0R

  • Boilot, J.-P., 11

  • Bunday, Benjamin, 0E

  • Burnett, Bryan R., 0L, 19

  • Cady, Sherry L., 0Q

  • Cizmar, Petr, 05

  • Conte, Sean, 1C

  • Cormia, Robert D., 0N

  • Dagata, John A., 0W

  • Desboeufs, N., 11

  • Di Donato, Andrea, 13

  • Erikson, Gregory S., 1C

  • Fabbri, F., 11

  • Faccinelli, M., 07

  • Fang, Chao, 18

  • Farina, Marco, 13

  • Farkas, Natalia, 0W

  • Fu, Wei-En, 0W

  • Gacoin, T., 11

  • Gao, Wanrong, 0X

  • Gotszalk, Teodor, 0A, 0R

  • Grabiec, Piotr, 0A, 0R

  • Grosse, Keith, 0Q

  • Hadley, P., 07

  • He, Bo-Ching, 0W

  • Healy, Nancy, 0P

  • Ippoliti, Gianluca, 13

  • Ito, Sukehiro, 04, 08

  • Janssen, Martin, 0J

  • Janus, Paweł, 0A, 0R

  • Kawanishi, Shinsuke, 04

  • Keller, Anna Lena, 0B

  • Kemen, Thomas, 0B

  • Kessler, David, 10

  • Kirnstoetter, S., 07

  • Knijnenberg, Alwin, 0J

  • Koehler, Bernd, 0R

  • Kopiec, Daniel, 0A, 0R

  • Kraxner, A., 07

  • Lahlil, K., 11

  • Lassailly, Y., 11

  • Lercel, Michael, 0E

  • Loeffler, B., 07

  • Majstrzyk, Wojciech, 0R

  • Malloy, Matt, 0E

  • Martinelli, L., 11

  • Meisburger, Dan, 0C

  • Mencarelli, Davide, 13

  • Menshew, D. E., 0M

  • Minixhofer, R., 07

  • Montgomery, Daniel D., 1C

  • Muray, Lawrence, 0C

  • Nakahira, Kenji, 04

  • Nakajima, Masato, 08

  • Newbury, Dale E., 0H

  • Nguyen, Anh, 0N

  • Niemeyer, Wayne D., 1C

  • Ominami, Yusuke, 04, 08

  • Orlando, Giuseppe, 13

  • Oye, Michael M., 0N

  • Peretti, J., 11

  • Postek, Michael T., 02, 05

  • Rangelow, Ivo W., 0A

  • Reithmeier, Eduard, 09

  • Ritchie, Nicholas W. M., 0H

  • Robertson, Stewart A., 18

  • Roger, F., 07

  • Rozzi, Tullio, 13

  • Rudek, Maciej, 0R

  • Scheuer, Renke, 09

  • Shi, Meng, 0N

  • Sierakowski, Andrzej, 0A, 0R

  • Sinha, Madhurendra Nath, 1A

  • Skiver, David, 0N

  • Smith, Mark D., 18

  • Spallas, James, 0C

  • Stamouli, Amalia, 0J

  • Thiel, Brad, 0E

  • Toal, Sarah J., 1C

  • Torres, Yessica, 0N

  • Ushiki, Tatsuo, 04, 08

  • Vaglio Pret, Alessandro, 18

  • Verma, Umesh Prasad, 1A

  • Villarrubia, J. S., 02

  • Vladár, András E., 02, 05

  • Vu, A. D., 11

  • Wells, Jennifer, 0Q

  • White, Thomas R., 0K

  • Wu, Chung-Lin, 0W

  • Zeidler, Dirk, 0B

Conference Committee

Conference Chairs

  • Michael T. Postek, National Institute of Standards and Technology (United States)

  • Dale E. Newbury, National Institute of Standards and Technology (United States)

  • S. Frank Platek, U.S. Food and Drug Administration (United States)

  • Tim K. Maugel, University of Maryland, College Park (United States)

Conference Program Committee

  • Eva M. Campo, Bangor University (United Kingdom)

  • Petr Cizmar, Physikalisch-Technische Bundesanstalt (Germany)

  • Ronald G. Dixson, National Institute of Standards and Technology (United States)

  • Lucille A. Giannuzzi, L.A. Giannuzzi & Associates LLC (United States)

  • Robert J. Gordon, Hitachi High Technologies America, Inc. (United States)

  • David C. Joy, The University of Tennessee, Knoxville (United States)

  • Michael J. McVicar, Centre of Forensic Sciences (Canada)

  • Bradley Thiel, College of Nanoscale Science & Engineering at SUNY Polytechnic Institute (United States)

  • John S. Villarrubia, National Institute of Standards and Technology (United States)

  • András E. Vladár, National Institute of Standards and Technology (United States)

Session Chairs

  • Keynote Session

  • Paul W. Ackmann, GLOBALFOUNDRIES Inc. (United States)

  • Naoya Hayashi, Dai Nippon Printing Company, Ltd. (Japan)

  • Michael T. Postek, National Institute of Standards and Technology (United States)

  • 1 Invited Session: Joint Session with Photomask and Scanning Microscopies

    Paul W. Ackmann, GLOBALFOUNDRIES Inc. (United States)

    Naoya Hayashi, Dai Nippon Printing Company, Ltd. (Japan)

    Michael T. Postek, National Institute of Standards and Technology (United States)

  • 2 Advanced Scanning Microscopies I

    Tim K. Maugel, University of Maryland, College Park (United States)

    Dale E. Newbury, National Institute of Standards and Technology (United States)

  • 3 Advanced Scanning Microscopies II

    András E. Vladár, National Institute of Standards and Technology (United States)

    S. Frank Platek, U.S. Food and Drug Administration (United States)

  • 4 Advanced Scanning Microscopies III

    Dale E. Newbury, National Institute of Standards and Technology (United States)

    Michael T. Postek, National Institute of Standards and Technology (United States)

  • 5 Metrology: Joint Session with Photomask and Scanning Microscopies

    Michael T. Postek, National Institute of Standards and Technology (United States)

    Thomas Scherübl, Carl Zeiss SMS GmbH (Germany)

  • 6 Scanning Microscopies in Forensic Science

    S. Frank Platek, U.S. Food and Drug Administration (United States)

  • 7 Scanning STEM Session

    Robert Gordon, Hitachi High Technologies America, Inc. (United States)

    Michael T. Postek, National Institute of Standards and Technology (United States)

  • 8 Advanced Scanned Probe Microscopies

    Ronald G. Dixson, National Institute of Standards and Technology (United States)

    Aaron Cordes, SEMATECH Inc. (United States)

  • 9 Advanced Optical Microscopies I

    András E. Vladár, National Institute of Standards and Technology (United States)

    Tim K. Maugel, University of Maryland, College Park (United States)

  • 10 Advanced Optical Microscopies II

    Tim K. Maugel, University of Maryland, College Park (United States)

    Dale E. Newbury, National Institute of Standards and Technology (United States)

  • 11 Advancements in Modeling

    John S. Villarrubia, National Institute of Standards and Technology (United States)

    András E. Vladár, National Institute of Standards and Technology (United States)

Poster Session

  • Michael T. Postek, National Institute of Standards and Technology (United States)

  • Tim K. Maugel, University of Maryland, College Park (United States)

Introduction

The SPIE Scanning Microscopies 2014 symposium (Conference 9236) brought microscopists from all aspects of scanning microscopies, from scanned optics and probes to scanned particle beams, together in a single forum to discuss current research and new advancements in the field. For the first time, in 2014 Scanning Microscopies was co-located with SPIE Photomask Technology in Monterey, California, United States. The co-locating of the two conferences was very synergistic because of the reliance of the photomask industry on scanned microscopies, so two joint sessions were designed to take advantage of potential technology transfer between the two conferences.

The Scanning Microscopies conferences have been typically instrument- and technique-intensive. With that in mind, two joint sessions with the Photomask Technology symposium (Conference 9235) were designed to “cross-pollinate” between the two conferences. Invited presentations of joint conference interest were offered, such as: “3D Monte Carlo modeling of the SEM: Are there applications to photomask metrology?” (9236-1), “Three-dimensional SEM metrology at 10nm” (9236-16), “Assessing the viability of multi-column electron-beam wafer inspection for sub-20nm defects” (9236-14), and “Photomask linewidth comparison by PTB and NIST” (9236-15). In addition, there were a number of general, tutorial-like, invited presentations, such as: “Rigorous quantitative elemental micro-analysis by scanning electron microscopy/energy dispersive x-ray spectrometry (SEM/EDS)” (9236-17) and “Does your SEM really tell the truth? Part 3” (9236-4), which discussed some of the basics of measurement and energy dispersive x-ray microanalysis in the scanning microscope.

This year, Scanning Microscopies 2014 awarded Dr. David C. Joy, Distinguished Professor of the University of Tennessee and Distinguished Scientist of the Oak Ridge National Laboratory, the 2014 Professor Sir Charles Oatley Memorial Award: “In recognition of his extraordinary contributions to scanning microscopy (electron and ion), including high resolution SEM, low voltage SEM, helium ion microscopy, electron- and ion-beam- specimen interactions, and SEM applications to semiconductor and magnetic materials. His tireless efforts to educate, inform, and inspire his students and colleagues have enormously advanced the field of microscopy.”

The Scanning Microscopy 2013 conference was quite successful, but this year the number of papers exceeded those from the previous DSS conference by nearly a factor of two. A diverse offering of papers covering forensics applications, scanning electron microscopy, helium ion microscopy, scanned probe microscopy, scanned optical microscopy and particle beam microscopy, and electron beam interaction modeling were presented. The “Microscopy for STEM Educators” workshop, initially introduced at DSS 2012, continued in 2014. The session consisted of presentations on the successful implementation of microscopy in the classroom. In a follow-up session, teachers were able to use a table-top scanning electron microscope and atomic force microscope to examine material they had brought with them. The “Microscopy for STEM Educators” workshop provided the opportunity for an introduction to analytical techniques traditionally only available in the research laboratory, and to see unprecedented images of everyday materials, to expand teachers’ understanding of what is possible in the laboratory and classroom. The workshop was broken into a series of presentations and a laboratory session. The presentations discussed the successful applications of advanced scientific instrumentation to engage the learners and promote next-generation science standards inquiry. Following the “Microscopy for STEM Educators” workshop, teachers had the opportunity to visit the Exhibit Hall, where they were encouraged to ask questions of the manufacturers and take advantage of the handouts.

Michael T. Postek

Dale E. Newbury

S. Frank Platek

Tim K. Maugel

© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 9236", Proc. SPIE 9236, Scanning Microscopies 2014, 923601 (23 October 2014); doi: 10.1117/12.2086290; https://doi.org/10.1117/12.2086290
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