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31 October 2014 Thin films characterizations to design high-reflective coatings for ultrafast high power laser systems
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Abstract
Dielectrics as single layers and broadband high-reflective stacks were deposited by electron beam deposition processes compatible with 1-meter class optics. After being physically and optically characterized, samples were irradiated with several ultrafast lasers (KYW:Yb 500fs, Ti:Sa 40fs and Ti:Sa 11fs) with single and multi-pulses. The setups of the test platforms, laser-induced damage threshold investigations of intrinsic materials, dielectric multilayers and hybrid metal/dielectric multilayers and electric field intensity distributions are described.
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Adrien Hervy, Laurent Gallais, Daniel Mouricaud, Gilles Chériaux, Olivier Utéza, Raphael Clady, Marc Sentis, and Antoine Fréneaux "Thin films characterizations to design high-reflective coatings for ultrafast high power laser systems", Proc. SPIE 9237, Laser-Induced Damage in Optical Materials: 2014, 92370J (31 October 2014); https://doi.org/10.1117/12.2068047
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