18 November 2014 Dual-wavelength ultra-short pulse laser damage testing
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Proceedings Volume 9237, Laser-Induced Damage in Optical Materials: 2014; 92371Q (2014); doi: 10.1117/12.2068180
Event: SPIE Laser Damage, 2014, Boulder, Colorado, United States
Abstract
In the femtosecond regime laser damage thresholds are often determined by the electric field distribution within the optical component. Commercially available ultra-short pulse laser systems provide ever increasing output powers in fundamental and harmonic wavelengths. Therefore, an increasing demand for frequency conversion or multiwavelengths optics with high damage thresholds for both, fundamental and second harmonic wavelengths is given. These optics are under increased strain and face even more design difficulties. Also, the electric field distribution is of higher complexity and favors multi-photon excitation of high efficiencies. We investigate the LIDT of dichroic high reflecting mirrors under simultaneous exposure to fundamental and second harmonic radiation. As laser source we use a Ti:Sa system delivering sub 200 fs pulses at 780nm/390nm. A delay-line was incorporated to ensure temporal overlap of the 2 pulses in the test plane. Further, the LIDT of a single layer of Ta2O5 under irradiation with fundamental and second harmonic radiation is calculated and results are compared with our experiment.
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Mark Gyamfi, Peter Jürgens, Mathias Mende, Lars Jensen, Detlev Ristau, "Dual-wavelength ultra-short pulse laser damage testing", Proc. SPIE 9237, Laser-Induced Damage in Optical Materials: 2014, 92371Q (18 November 2014); doi: 10.1117/12.2068180; http://dx.doi.org/10.1117/12.2068180
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KEYWORDS
Electrons

Ionization

Laser damage threshold

Laser induced damage

Mirrors

Absorption

Data modeling

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