3 February 2015 Crystalline micro/nanostructures fabrication on silicon using femtosecond laser
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Proceedings Volume 9255, XX International Symposium on High-Power Laser Systems and Applications 2014; 92553W (2015) https://doi.org/10.1117/12.2071333
Event: XX International Symposium on High Power Laser Systems and Applications, 2014, Chengdu, China
Abstract
The laser induced micro/ nano-meter size surface structures are fabricated by multi linear polarized femtosecond laser pulses (pulse duration τ=35 fs, wavelength λ=800 nm) irradiation at room temperature(25 ℃ ) and 400 ℃. The structures fabricated at these two temperatures show distinct temperature dependence. The grooves, which are parallel to the polarization of the laser light, can be clearly observed at almost all the structured area formed at 400 ℃ while laser induced period structures(ripples) are the most pronounced surface structure in the crater formed at room temperature. The crystallinity of these surface structures are investigated by using Raman spectroscopy. The Raman spectrum shows that all the structured area formed at 400 ℃ is crystalline(or poly-crystalline) while amorphous silicon can be observed within the structures formed at room temperature (25 ℃). These results indicate that temperature is an important parameter to be tuned to tailor the micro/nano-structure fabrication.
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Guoliang Deng, Xianheng Yang, Guoying Feng, Shouhuan Zhou, "Crystalline micro/nanostructures fabrication on silicon using femtosecond laser", Proc. SPIE 9255, XX International Symposium on High-Power Laser Systems and Applications 2014, 92553W (3 February 2015); doi: 10.1117/12.2071333; https://doi.org/10.1117/12.2071333
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