3 February 2015 Femtosecond laser induced surface structuring on silicon by diffraction-assisted micropatterning
Author Affiliations +
Proceedings Volume 9255, XX International Symposium on High-Power Laser Systems and Applications 2014; 925540 (2015) https://doi.org/10.1117/12.2071378
Event: XX International Symposium on High Power Laser Systems and Applications, 2014, Chengdu, China
Abstract
Femtosecond laser micropatterning of silicon with nanometric surface modulation is demonstrated by irradiating through a diffracting pinhole. The irradiation results obtained at fluences above the melting threshold are characterized by optical and scanning electron microscopy and reveal a good agreement with Fresnel diffraction theory. LIPSS have been generated in the micropatterning surface. We found Ripples spacing were found of 550-680 nm. Based on the Sipe and Drude model, the theoretical period of LIPSS is closer to experimental measurements. Due to the diffraction, the LIPPS having a different period appear in a diffraction micropatterning.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shutong Wang, Guoying Feng, "Femtosecond laser induced surface structuring on silicon by diffraction-assisted micropatterning", Proc. SPIE 9255, XX International Symposium on High-Power Laser Systems and Applications 2014, 925540 (3 February 2015); doi: 10.1117/12.2071378; https://doi.org/10.1117/12.2071378
PROCEEDINGS
6 PAGES


SHARE
Back to Top