28 July 2014 Characterization of decay component of resist surface charging on EBM-8000
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Abstract
In our previous work, we reported the static portion of the surface charging on EBM-8000 and compared it with that on EBM-6000. The scope of this paper is to report the analysis of charging decay component on EBM-8000 and compare it with EBM-6000. We confirmed that our fundamental modeling scheme of the charging decay worked well on EBM-8000 as well as on EBM-6000. However, we found totally different charging decay behaviors between EBM-8000 and EBM-6000. To explain the results, we propose a conceptual model of the charging decay phenomena both on EBM-8000 and EBM-6000.
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Noriaki Nakayamada, Takashi Kamikubo, Hirohito Anze, Muheniro Ogasawara, "Characterization of decay component of resist surface charging on EBM-8000", Proc. SPIE 9256, Photomask and Next-Generation Lithography Mask Technology XXI, 925609 (28 July 2014); doi: 10.1117/12.2070827; https://doi.org/10.1117/12.2070827
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