28 July 2014 Built-in lens mask lithography: challenge for high definition lens-less lithography
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Abstract
Novel photo-lithography is newly proposed named built-in lens mask lithography. The method emulates optical propagation plane in exposure system using binary transmittance and phase mask instead of projection lens. The performance of the built-in lens mask lithography is studied by numerical simulation and experimental study using conventional proximity exposure system. The result shows resolution enhancement in deep focus plane.
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Naoki Ueda, Naoki Ueda, Masaru Sasago, Masaru Sasago, Akio Misaka, Akio Misaka, Hisao Kikuta, Hisao Kikuta, Hiroaki Kawata, Hiroaki Kawata, Yoshihiko Hirai, Yoshihiko Hirai, "Built-in lens mask lithography: challenge for high definition lens-less lithography", Proc. SPIE 9256, Photomask and Next-Generation Lithography Mask Technology XXI, 92560A (28 July 2014); doi: 10.1117/12.2065251; https://doi.org/10.1117/12.2065251
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