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28 July 2014 Defect analysis on actinic blank inspection tool
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Abstract
While extreme ultraviolet lithography (EUVL) is the leading candidate of the next generation lithography, the challenge of managing blank defects must be overcome before EUVL being put to practical use. Besides the efforts of manufacturing defect free blanks, the use of mitigation technique called “pattern shift” is now considered to be a more feasible solution. Whether we aim for defect free blanks or use pattern shift, however, it is quite important to understand the properties of the defects on EUV masks. Of particular interest is to distinguish phase defects from amplitude defects, and pits from bumps. To address the need to understand defect properties, the Actinic Blank Inspection (ABI) high volume manufacturing (HVM) model has acquired a review function using a 1200x magnification optics capable of accurately measuring the size and shape of defects. In this paper, we will discuss how the ABI HVM model classifies defects into pits and bumps.
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Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Hidehiro Watanabe, and Ichiro Mori "Defect analysis on actinic blank inspection tool", Proc. SPIE 9256, Photomask and Next-Generation Lithography Mask Technology XXI, 92560O (28 July 2014); https://doi.org/10.1117/12.2069197
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