Polarization aberration function for perturbed lithographic lens

Wei Huang; Xiangru Xu; Mingfei Xu; Weicai Xu; Zhaoxin Tang

doi:10.1117/12.2073629

5 November 2014 Polarization aberration function for perturbed lithographic lens

Wei Huang, Xiangru Xu, Mingfei Xu, Weicai Xu, Zhaoxin Tang

Proceedings Volume 9272, Optical Design and Testing VI; 92720G (2014) https://doi.org/10.1117/12.2073629
Event: SPIE/COS Photonics Asia, 2014, Beijing, China

Abstract

A comprehensive polarization aberration function is proposed to evaluate the imaging quality of a perturbed high NA lithographic lens. In this function, the system polarization aberration, i.e. Jones matrix, is decomposed into several basic parts as wavefront aberration, apodization, diattenuation, retardance and rotation by single value decomposition (SVD). The wavefront aberration is described by field-Zernike polynomials (FZP), and the diattenuation, as well as retardance, is described by field-orientation Zernike polynomials (FOZP). The relationship of system polarization aberration with pupil, field and manufacturing errors is established by an approximately analytical equation, which provides a possible way to analyze lens tolerance for polarization aberration.

Citation Download Citation

Wei Huang, Xiangru Xu, Mingfei Xu, Weicai Xu, and Zhaoxin Tang "Polarization aberration function for perturbed lithographic lens", Proc. SPIE 9272, Optical Design and Testing VI, 92720G (5 November 2014); https://doi.org/10.1117/12.2073629

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