5 November 2014 Two-dimension lateral shearing interferometry for microscope objective wavefront metrology
Author Affiliations +
Abstract
Lateral shearing interferometry was an attractive technique to measure the wavefront aberration of high numerical aperture microscope objective lens. A two-dimension lateral shearing interferometer based on chessboard grating was designed for microscope objective wavefront metrology. By positioning the chessboard grating at the Talbot distance of the objective focal plane, the wavefront was divided and sheared in two-dimension. By applying two-dimensional Fourier transform method and differential Zernike polynomial fitting, Zernike coefficients of the wavefront were obtained. A 10x, NA0.25 microscope objective was measured at 632.8nm wavelength, the results showed that the wavefront of the objective was 0.755λ PV, 0.172λ RMS, the repeatability(3σ) of RMS at random grating position was 2.3mλ, the repeatability(3σ) of Z5 to Z36 at random grating position were better than 17mλ.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhixiang Liu, Zhixiang Liu, Tingwen Xing, Tingwen Xing, Yadong Jiang, Yadong Jiang, Baobin Lv, Baobin Lv, Fuchao Xu, Fuchao Xu, } "Two-dimension lateral shearing interferometry for microscope objective wavefront metrology", Proc. SPIE 9272, Optical Design and Testing VI, 92721B (5 November 2014); doi: 10.1117/12.2071500; https://doi.org/10.1117/12.2071500
PROCEEDINGS
8 PAGES


SHARE
Back to Top