Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 9276, including the Title Page, Copyright information, Table of Contents, Introduction (if any), and Conference Committee listing.
Han, Yoshizawa, and Zhang: Front Matter: Volume 9276

The papers included in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. The papers published in these proceedings reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon.

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Author(s), “Title of Paper,” in Optical Metrology and Inspection for Industrial Applications III, edited by Sen Han, Toru Yoshizawa, Song Zhang, Proceedings of SPIE Vol. 9276 (SPIE, Bellingham, WA, 2014) Article CID Number.

ISSN: 0277-786X

ISBN: 9781628413496

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Authors

Numbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Aketagawa, Masato, 1C

Cao, Hui-bin, 1P

Cao, YangYang, 0A

Cen, Zhaofeng, 1L

Chen, Dong, 0I

Chen, Guang, 0L

Chen, Siwen, 0T

Cheng, Xiaosheng, 1H

Cheng, Xu, 08, 1D

Cui, Haihua, 1H

Dai, Fengzhao, 17

Dai, Junfei, 0C

Dai, Ning, 1H

Dai, Xianglu, 25

Ding, Keqin, 0L

Ding, Quanxin, 0S

Dong, Hao, 1W

Fan, Junliu, 1Q, 1S

Faridian, Ahmad, 02

Feng, Qibo, 0L

Filatov, Yuri V., 26

Fu, Yuegang, 0Y

Gan, Haiyong, 15

Gao, Jingjing, 19

Gao, Peng, 1M

Gao, Sitian, 0T

Gong, Chen, 0Q

Gu, Yonggang, 1I

Guan, Xin, 0U

Gui, Hua-qiao, 0A, 1P

Guo, Changye, 1H

Guo, Fudong, 17

Guo, Qinghua, 0W

Guo, Zhenglai, 0Y

Han, Sen, 0M, 0Y, 1O

He, Wantao, 1D

He, Yingwei, 1G

Hiratsuka, Shun, 0G

Hofherr, O., 0V

Hou, Zhiling, 0N

Huang, Lu, 1R

Huang, PingXian, 1L

Huang, Shujun, 04

Huang, Zhe, 0A

Jiang, Hongzhi, 1A

Jiang, Yu, 0Z

Jin, Hongzhen, 1K

Jin, Yuan, 1L

Kamakura, Yoshihisa, 0G

Ke, Jun, 19

Kettel, Johannes, 09

Larichev, Roman A., 26

Lei, Z., 24

Li, Beiwen, 0Q

Li, Da, 0F

Li, Dong, 1X, 1Y

Li, Dongsheng, 0T

Li, Guowei, 13

Li, Haipeng, 1G

Li, Huijun, 0K

Li, Jian, 15

Li, Jianwei, 15

Li, Lichun, 05

Li, Mengyuan, 10

Li, Mingyang, 03

Li, Qi, 0T

Li, Shi, 0T

Li, Tongbao, 1R

Li, Wei, 0T

Li, Xiaotong, 1L

Li, Xuan, 20

Li, Xudong, 1A

Li, Xue, 0N

Li, Xueyuan, 0Y

Li, Xunwu, 1S

Li, Yan, 1T, 1U

Li, Yang, 1W

Li, Yanjie, 25

Li, Yong, 17

Li, Yong, 1K, 1M

Li, ZhongWei, 08, 0D, 0J, 1D, 1J

Liao, Yunjiang, 1A

Lin, Gui-Wen, 1X

Lin, Ke, 0K

Liu, Chun-Yang, 1Y

Liu, Cuiling, 0K

Liu, Dingpu, 1G

Liu, Hua, 0S

Liu, Jian-guo, 1P

Liu, Jun, 1N

Liu, Xiuying, 1R

Liu, Yang, 1A

Liu, Yong, 03

Liu, Zhenghao, 0K

Liu, Zhongyou, 1R

Lu, Yunjun, 17

Lu, Zhuliang, 1R

Ma, Hui, 0F

Meng, Fangfang, 1U

Meng, Haifeng, 1G

Müller, Claas, 09, 0V

Nakamura, Katsumasa, 0G

Ni, Kai, 1W

Ning, D., 24

Novak, Matt, 0I

Osten, Wolfgang, 02

Ou, Jinping, 20

Pedrini, Giancarlo, 02

Qian, Jin, 1R

Reinecke, Holger, 09, 0V

Ren, Peng, 20

Schmit, Joanna, 0I

Shang, Desheng, 05

Shi, Chengying, 1G

Shi, YuSheng, 08, 0D, 0J, 1D

Shi, Yushu, 0T

Singh, Alok Kumar, 02

Situ, Guohai, 13, 1N

Song, Xu, 0T

Stover, John C., 0M

Sun, Hao, 0Y

Sun, Haojie, 10

Sun, Jun, 05

Sun, Weimin, 0Z

Tang, Feng, 17

Tao, Wei, 1Z

Tian, Jin-Dong, 1X, 1Y

Tu, Yanshuai, 1K

Wachten, C., 0V

Wakayama, Toshitaka, 0G

Wan, Wenhui, 05

Wan, Xiulong, 17

Wang, Congjun, 0D

Wang, Huan-qin, 0A, 1P

Wang, Jian, 1K, 1M

Wang, Jianbo, 1R

Wang, Jie, 1P

Wang, Jun, 1Q, 1S

Wang, Qian, 19

Wang, Xiangzhao, 17

Wang, Xioahui, 0N

Wang, Xuanze, 0U

Wang, Youqing, 1Q

Wei, Dong, 1C

Wei, Haoyun, 1T

Wei, Ping, 19

Wei, Yifan, 0W

Weng, Jinping, 1H

Wu, Guanhao, 1W

Wu, Mengqi, 0J

Wu, Quanying, 1N, 1O, 1Q, 1S

Wu, Xuejian, 1U

Wu, Yuxiang, 03

Wuhe, Z., 24

Xi, Jiangtao, 0K, 0W

Xia, Zemin, 1J

Xiao, Suzhi, 1Z

Xie, Huimin, 25

Xu, Kun, 1O

Xu, Liang, 1G

Xu, Mingfei, 1W

Xu, Nan, 15

Xu, Xiaobin, 1N

Xu, Yinghui, 05

Yan, Hao, 1Z

Yan, Yunxiang, 0Z

Yang, Liangen, 0U

Yang, Yixin, 0A

Yi, Jingya, 03

Yin, Cong, 1R

Yin, Yongkai, 0W

Yoshizawa, Toru, 0G

Yu, Yanguang, 0K, 0W

Yue, Huimin, 03

Zeng, Maomao, 0F

Zeng, Nan, 0F

Zhai, Chao, 1I

Zhai, Zhongsheng, 0U

Zhan, Guomin, 08, 0J

Zhang, Dawei, 10

Zhang, Qican, 0N

Zhang, Qiyuan, 1O

Zhang, Song, 0C, 0Q

Zhang, Wei, 05

Zhang, Zhiliang, 1M

Zhang, Zhixin, 15

Zhang, Zonghua, 04

Zhao, Can, 1D

Zhao, HengShuang, 08

Zhao, Hui, 1Z

Zhao, Huijie, 1A

Zhao, Mantong, 22

Zhao, Shijie, 1T

Zheng, Guoquan, 04

Zheng, Jianchao, 0Z

Zhong, Kai, 0D, 0J, 1D, 1J

Zhou, Fan, 1G

Zhou, Jianliang, 05

Zhou, Liwei, 0S

Zhou, Qian, 1W

Zhou, Xiaohui, 0D

Zhou, Yao, 23

Zhou, Zhi, 20

Zhu, Jianrong, 0Y

Zhu, Ye, 1I

Zhuang, Jie, 10

Symposium Committees

General Chairs

  • H. Philip Stahl, NASA Marshall Space Flight Center (USA)

  • Bingkun Zhou, Tsinghua University (China)

General Co-chairs

  • Arthur Chiou, National Yang-Ming University (Taiwan, China)

  • Jianlin Cao, China Ministry of Science and Technology (China)

  • Junhao Chu, Shanghai Institute of Technical Physics (China)

Technical Program Chairs

  • Songlin Zhuang, Shanghai University of Science and Technology (China)

  • Xingde Li, Johns Hopkins University (United States)

Technical Program Co-chairs

  • Qiming Wang, Institute of Semiconductors (China)

  • Xu Liu, Zhejiang University (China)

  • Daoyin Yu, Tianjin University (China)

  • Qihuang Gong, Peking University (China)

  • Tianchu Li, National Institute of Metrology (China)

  • Wei Huang, Nanjing University of Posts and Telecommunications (China)

Local Organizing Committee Chair

  • Guangcan Guo, University of Science and Technology of China (China)

Local Organizing Committee Co-chairs

  • Guoqiang Ni, Beijing Institute of Technology (China)

  • Shusen Xie, Fujian Normal University (China)

  • Xiaomin Ren, Beijing University of Posts and Telecommunications (China)

  • Ying Gu, People’s Liberation Army General Hospital (China)

  • Huilin Jiang, Changchun University of Science and Technology (China)

General Secretary

  • Qihuang Gong, Peking University (China)

Local Organizing Committee

  • Yan Li, Chinese Optical Society/Peking University (China)

  • Zhiping Zhou, Peking University (China)

  • Changhe Zhou,Shanghai Institute of Optics and Fine Mechanics (China)

  • Qingming Luo, Huazhong University of Science and Technology (China)

  • Chongxiu Yu, Beijing University of Posts and Telecommunications (China)

  • Hongda Chen, Institute of Semiconductors (China)

  • Yongtian Wang, Beijing Institute of Technology (China)

  • Yiping Cui, Southeast University (China)

  • Xuping Zhang, Nanjing University (China)

  • Feijun Song, Daheng Corporation (China)

  • Cunlin Zhang, Capital Normal University (China)

  • Yanting Lu, Nanjing University (China)

  • Yuejin Zhao, Beijing Institute of Technology (China)

  • Chunqing Gao, Beijing Institute of Technology (China)

  • Tiegen Liu, Tianjin University (China)

  • Xiaocong Yuan,Nankai University (China)

  • Weimin Chen, Chongqing University (China)

  • Zhongwei Fan, Academy of Optoelectronics (China)

  • Hanyi Zhang, Tsinghua University (China)

  • Lan Wu, Zhejiang University (China)

  • Yongsheng Zhang, University of Science and Technology of China (China)

  • Hong Yang, Peking University (China)

  • Xiaoying Li, Tianjin University (China)

  • Wei Xiong, Chinese Optical Society (China)

Conference Committee

Conference Chairs

  • Sen Han, University of Shanghai for Science and Technology (China) and Suzhou H&L Instruments LLC (China)

  • Toru Yoshizawa, Tokyo University of Agriculture and Technology (Japan) and 3D Associates (Japan)

  • Song Zhang, Iowa State University (United States)

Conference Program Committee

  • Masato Aketagawa, Nagaoka University of Technology (Japan)

  • Yasuhiko Arai, Kansai University (Japan)

  • Xunde Bao, The University of Arizona (United States)

  • James H. Burge, College of Optical Sciences, The University of Arizona (United States)

  • Yuanshen Cao, National Institute of Measurement and Testing Technology (China)

  • Dong Chen, Bruker Nano Inc. (United States)

  • Jun Chen, Tokyo Polytechnic University (Japan)

  • Garrett D. Cole, Crystalline Mirror Solutions GmbH (Austria)

  • Yuegang Fu, Changchun University of Science and Technology (China)

  • Qingying Jim Hu, QUEST Integrated, Inc. (United States)

  • Zhihua Jiang, Shanghai Institute of Measurement and Testing Technology (China)

  • Kazuhide Kamiya, Toyama Prefectural University (Japan)

  • Katsuichi Kitagawa, Independent Consultant (Japan)

  • Malgorzata Kujawinska, Warsaw University of Technology (Poland)

  • Chao-Wen Liang, National Central University (Taiwan, China)

  • Yuxiang Lin, ASML (United States)

  • Yukitoshi Otani, Utsunomiya University (Japan)

  • Giancarlo Pedrini, Institut für Technische Optik (Germany)

  • Xiang Peng, Shenzhen University (China)

  • Kemao Qian, Nanyang Technological University (Singapore)

  • Guohai Situ, Shanghai Institute of Optics and Fine Mechanics (China)

  • H. Philip Stahl, NASA Marshall Space Flight Center (United States)

  • John C. Stover, The Scatter Works Inc. (United States)

  • Takamasa Suzuki, Niigata University (Japan)

  • Xiaodi Tan, Beijing Institute of Technology (China)

  • Toshitaka Wakayama, Saitama Medical University (Japan)

  • Xiangzhao Wang, Shanghai Institute of Optics and Fine Mechanics (China)

  • Jiangtao Xi, University of Wollongong (Australia)

  • Lianxiang Yang, Oakland University (United States)

  • Dawei Zhang, University of Shanghai for Science and Technology (China)

  • Hao Zhang, Tianjin University (China)

  • Heng Zhang, National Institute of Metrology (China)

  • Ping Zhong, Donghua University (China)

  • Ping Zhou, The University of Arizona (United States)

  • Weihu Zhou, Academy of Opto-Electronics (China)

Session Chairs

  • 1 Optical Metrology Methods I

    Giancarlo Pedrini, Institut für Technische Optik (Germany)

    Sen Han, University of Shanghai for Science and Technology (China)

  • 2 Optical Metrology Methods II

    Toru Yoshizawa, Tokyo University of Agriculture and Technology (Japan) and 3D Associates (Japan)

    Weihu Zhou, Academy of Opto-Electronics (China)

  • 3 Optical Metrology Methods III

    Song Zhang, Iowa State University (United States)

    Yukitoshi Otani, Utsunomiya University (Japan)

  • 4 Optical Metrology Methods IV

    Weihu Zhou, Academy of Opto-Electronics (China)

    Guohai Situ, Shanghai Institute of Optics and Fine Mechanics (China)

  • 5 Optical Metrology Methods V

    Junfei Dai, Zhejiang University (China)

    Giancarlo Pedrini, Institut für Technische Optik (Germany)

    Xing Zhong, Changchun Institute of Optics, Fine Mechanics and Physics (China)

  • 6 Optical Metrology Methods VI

    Yukitoshi Otani, Utsunomiya University (Japan)

    Song Zhang, Iowa State University (United States)

    Dong Chen, Bruker Nano Inc. (United States)

  • 7 Optical Metrology Applications I

    Dong Chen, Bruker Nano Inc. (United States)

    Junfei Dai, Zhejiang University (China)

    Guohai Situ, Shanghai Institute of Optics and Fine Mechanics (China)

  • 8 Optical Metrology Applications II

    Xing Zhong, Changchun Institute of Optics, Fine Mechanics and Physics (China)

    Toru Yoshizawa, Tokyo University of Agriculture and Technology (Japan) and 3D Associates (Japan)

    Chao-Wen Liang, National Central University (Taiwan, China)

Introduction

This is the proceedings of the conference on Optical Metrology and Inspection for Industrial Applications III that was held as part of SPIE/COS Photonics Asia (in Beijing, China, 9–11 October 2014). This conference focuses on methods, analysis, and applications of optical metrology and inspection that have been applied to various industries with a particular emphasis on the manufacturing industry. The field of optical metrology and inspection has rapidly grown to wide acceptance for many industrial applications. For example, the requirement from industry realized high-speed and downsized measurement systems, and advances in machine/robot vision have provided compact and smart camera systems, new lighting systems, and better ways of data transfer.

Non-contact methods based on optical imaging principles have been seen wide use in the mechanical engineering and electronics industry, and also made advances in traditional manufacturing areas such as automotive and aerospace manufacturing. These methods are also being used for defect and flaw inspection, and precision measurements. Recent computing power has made analysis methods such as phase-shifting a viable tool for fast on-line inspection for process control and metrology applications. This conference is intended to address the latest advances and future developments in the areas of optical metrology and inspection as they are applied to practical applications in various industries.

In these proceedings, papers submitted to the conference are presented in the following eight sessions: Optical Metrology Methods I to VI and Optical Metrology Applications I and II, and one Poster Session.

In addition to optical principles and techniques, imaging methods and analysis techniques have also become more and more popular in practical applications due to rapid advanced computational processing methods, camera systems and device technologies including various optoelectrical elements and devices. In the next conference scheduled in 2016, more papers are expected to be presented in those areas as well.

Sen Han

Toru Yoshizawa

Song Zhang

© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 9276", Proc. SPIE 9276, Optical Metrology and Inspection for Industrial Applications III, 927601 (18 December 2014); doi: 10.1117/12.2181473; https://doi.org/10.1117/12.2181473
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