Translator Disclaimer
13 November 2014 Optimizing binary dithering patterns to improve phase quality
Author Affiliations +
This paper intends to thoroughly evaluate the influences of different phase-shifting algorithms, and optimization directions, and initial patterns. For fair comparisons, we used the same number of iterations for optimization and the same size of optimization patches. The variables are optimization domain (i.e., phase and intensity domain), the step number of the phase-shifting algorithm (i.e.. three and four step), the initial pattern (i.e., Bayer dithered and error diffusion dithered pattern), and the optimization direction (i.e., top to bottom, bottom to top, left to right, and right to left). Our ultimate goal is to generate the best possible quality binary pattern after optimization and hopefully provides guidelines on optimization strategies. Our simulation results suggest that an exhaustive optimization is necessary in order to produce the best quality pattern.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Junfei Dai and Song Zhang "Optimizing binary dithering patterns to improve phase quality", Proc. SPIE 9276, Optical Metrology and Inspection for Industrial Applications III, 92760C (13 November 2014);


Back to Top