Translator Disclaimer
13 November 2014 A high-accuracy subaperture stitching system for nonflatness measurement of wafer stage mirror
Author Affiliations +
Abstract
Nonflatness of stage mirror surface affects the position accuracy of the wafer stage in lithography tool. Precise surface flatness measurement is needed for the computer controlled polishing of stage mirror. A subaperture stitching system using a commercial 4-inch Fizeau interferometer was presented in this paper. Absolute test was used to calibrate the surface figure of the reference mirror with the accuracy better than λ/100 PV (λ = 632.8nm). Subaperture stitching was used to extend the measurement aperture larger than 450×50mm. Stitching measurements were carried out for stage mirrors during surface polishing. Comparison tests were also made with a 24-inch interferometer. The results show that the stitching system has the advantages of larger dynamic range, higher spatial resolution, and better measurement accuracy in local area.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yunjun Lu, Feng Tang, Xiangzhao Wang, Yong Li, Xiulong Wan, Fudong Guo, and Fengzhao Dai "A high-accuracy subaperture stitching system for nonflatness measurement of wafer stage mirror", Proc. SPIE 9276, Optical Metrology and Inspection for Industrial Applications III, 927617 (13 November 2014); https://doi.org/10.1117/12.2071824
PROCEEDINGS
9 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

High accurate subaperture testing
Proceedings of SPIE (September 17 2014)
Mounting of reference surface for a transmission sphere
Proceedings of SPIE (September 26 2016)
Development of swinging part profilometer for optics
Proceedings of SPIE (November 10 2016)
NOAO testing procedures for large optics
Proceedings of SPIE (March 25 1992)
Manufacturing and testing an 8.3-m astronomical mirror
Proceedings of SPIE (November 10 1999)

Back to Top