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13 November 2014 A high-accuracy subaperture stitching system for nonflatness measurement of wafer stage mirror
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Nonflatness of stage mirror surface affects the position accuracy of the wafer stage in lithography tool. Precise surface flatness measurement is needed for the computer controlled polishing of stage mirror. A subaperture stitching system using a commercial 4-inch Fizeau interferometer was presented in this paper. Absolute test was used to calibrate the surface figure of the reference mirror with the accuracy better than λ/100 PV (λ = 632.8nm). Subaperture stitching was used to extend the measurement aperture larger than 450×50mm. Stitching measurements were carried out for stage mirrors during surface polishing. Comparison tests were also made with a 24-inch interferometer. The results show that the stitching system has the advantages of larger dynamic range, higher spatial resolution, and better measurement accuracy in local area.
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Yunjun Lu, Feng Tang, Xiangzhao Wang, Yong Li, Xiulong Wan, Fudong Guo, and Fengzhao Dai "A high-accuracy subaperture stitching system for nonflatness measurement of wafer stage mirror", Proc. SPIE 9276, Optical Metrology and Inspection for Industrial Applications III, 927617 (13 November 2014);


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