Paper
13 November 2014 High-frequency deformation grating fabrication techniques and applications
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Abstract
The rapid development of micro-electronics and micro-nano material engineering make it an urgent task to characterize the mechanical properties of micro-device and micro-nano material accurately. Due to the advantages of high precision, high sensitivity and full field measurement, moiré method has been applied in the micro-deformation measurement widely. Since the grating is the indispensable deformation sensor of moiré method, how to fabricate high frequency grating with high quality is the key problem to solve for moiré method. In this paper, some fabrication techniques developed recently with their applications will be summarized, including holographic photolithography, electron beam lithography (EBL), focused ion beam (FIB) and nano-imprint lithography(NIL), aiming to popularize the applications of moiré method in the micro-deformation measurement and provide some valuable guidelines on how to choose a proper fabrication technique.
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Xianglu Dai, Yanjie Li, and Huimin Xie "High-frequency deformation grating fabrication techniques and applications", Proc. SPIE 9276, Optical Metrology and Inspection for Industrial Applications III, 927625 (13 November 2014); https://doi.org/10.1117/12.2074671
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KEYWORDS
Electron beam lithography

Fabrication

Holography

Metals

Optical lithography

Deflectometry

Electron beams

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