13 November 2014 Polarization aberration compensation method by adjusting illumination partial coherent factors in immersion lithography
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Abstract
As the numerical aperture (NA) increasing and process factor k1 decreasing in 193nm immersion lithography, polarization aberration (PA) of projection optics leads to image quality degradation seriously. Therefore, this work proposes a new scheme for compensating polarization aberration. By simulating we found that adjusting the illumination source partial coherent factors σout is an effective method for decreasing the PA induced pattern critical dimension (CD) error while keeping placement error (PE) within an acceptable range. Our simulation results reveal that the proposed method can effectively compensate large PA in actual optics.
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Yue Jia, Yanqiu Li, Lihui Liu, Chunying Han, Xiaolin Liu, "Polarization aberration compensation method by adjusting illumination partial coherent factors in immersion lithography", Proc. SPIE 9277, Nanophotonics and Micro/Nano Optics II, 92770Z (13 November 2014); doi: 10.1117/12.2087529; https://doi.org/10.1117/12.2087529
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