Translator Disclaimer
13 November 2014 A review: mid-infrared photonic crystals in silicon and porous silicon based on ion beam irradiation
Author Affiliations +
Silicon and porous silicon based photonic crystals are key aspects of photonic circuits with good compatibility with integrated circuits. Here a brief review is carried out on the fabrication of mid infrared photonic crystals using experimental processes of combining ion beam irradiation and electrochemical anodisation of silicon. Experimental processes have been developed to fabricate high aspect ratio trenches in porous silicon, high aspect ratio silicon pillars, buried channels in porous silicon, and multilevel freestanding silicon wires. These structures have the potential to be used for photonic crystals. Several 2D, quasi-3D and 3D mid infrared photonic crystals in porous silicon and silicon have been designed and fabricated.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhiya Dang, Mark Breese, Dongqing Liu, Shuvan Prashant Turaga, Sara Azimi, Jiao Song, Agnieszka Banas, and Gonzalo Recio-Sánchez "A review: mid-infrared photonic crystals in silicon and porous silicon based on ion beam irradiation", Proc. SPIE 9277, Nanophotonics and Micro/Nano Optics II, 92771Q (13 November 2014);


Focused-ion-beam cross-sectioning techniques using XeF2
Proceedings of SPIE (July 08 1992)
Post-treating techniques of porous silicon thin flm
Proceedings of SPIE (December 07 2004)
Current Status Of Ion Projection Lithography
Proceedings of SPIE (June 19 1985)
Resist cross-sectioning using focused ion beams
Proceedings of SPIE (July 08 1992)

Back to Top