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13 November 2014 Fabrication of nano-pillar with sub-100nm resolution based on thiol-ene
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Abstract
This paper demonstrates an approach to fabricate nano-pillar based on thiol-ene via soft-lithography. The template is anodic aluminum oxygen (AAO) with ordered nano-holes with the diameter of 90nm.The nano-pillar consists of rigid thiol-ene features on an elastic poly(dimethylsiloxane) (PDMS) support. It is capable of patterning both flat and curved substrate. The thiol-ene is a new green UV-curable polymer material, including a number of advantages such as rapid UV-curing in the natural environment, low-cost, high resolution, and regulative performance characteristic. Here, we fabricated a two-layer structure, which included rigid thiol-ene nano-pillar with sub-100nm resolution and soft PDMS substrate. The experiment results show that this approach can be used to fabricate high-resolution features and the thiol-ene is an excellent imprint material. The fabrication technique in this paper is simple, low-cost, high-resolution and easy to high throughput, which has broad application prospects in the preparation of nanostructures.
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Man Zhang, Qiling Deng, Lifang Shi, Hui Pang, Axiu Cao, and Song Hu "Fabrication of nano-pillar with sub-100nm resolution based on thiol-ene", Proc. SPIE 9277, Nanophotonics and Micro/Nano Optics II, 92771U (13 November 2014); https://doi.org/10.1117/12.2073892
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