6 August 2014 Preparation and optimization of the laser thin film filter
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Proceedings Volume 9281, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 928113 (2014) https://doi.org/10.1117/12.2069371
Event: 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2014), 2014, Harbin, China
Abstract
A co-colored thin film device for laser-induced damage threshold test system is presented in this paper, to make the laser-induced damage threshold tester operating at 532nm and 1064nm band. Through TFC simulation software, a film system of high-reflection, high -transmittance, resistance to laser damage membrane is designed and optimized. Using thermal evaporation technique to plate film, the optical properties of the coating and performance of the laser-induced damage are tested, and the reflectance and transmittance and damage threshold are measured. The results show that, the measured parameters, the reflectance R ≥ 98%@532nm, the transmittance T ≥ 98%@1064nm, the laser-induced damage threshold LIDT ≥ 4.5J/cm2 , meet the design requirements, which lays the foundation of achieving laser-induced damage threshold multifunction tester.
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Jun-hong Su, Wei Wang, Jun-qi Xu, Yao-jin Cheng, Tao Wang, "Preparation and optimization of the laser thin film filter", Proc. SPIE 9281, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 928113 (6 August 2014); doi: 10.1117/12.2069371; https://doi.org/10.1117/12.2069371
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