With the rapid development of optical testing technology, laser heterodyne interferometer has been used more and more widely. As the testing precision requirements continue to increase, the technical prism is an important component of heterodyne interference. The research utilizing thin film technology to improve optical performance of interferometer has been a new focus. In the article, based on the use requirements of interferometer beam splitting prism, select Ta2O5 and SiO2 as high and low refractive index materials respectively, deposit on substrate K9. With the help of TFCalc design software and Needle method, adopting electron gun evaporation and ion assisted deposition, the beam splitting prism is prepared successfully and the ratio of transmittance and reflectance for this beam splitting prism in 500~850 nm band, incident angle 45 degree is 8:2. After repeated tests, solved the difference problem of film deposition process parameters ,controlled thickness monitoring precision effectively and finally prepared the ideal beam splitting prism which is high adhesion and stable optics properties. The film the laser induced damage threshold and it meet the requirements of heterodyne interferometer for use.