Now it’s more and more higher for the image quality of lithography systems .Due to the errors in the processing and
assembly , the image quality of the traditional lens becomes lower and deviates from the theoretical value of the design.
To improve image quality, it’s necessary to adjust some lens. The new objective lens having the adjustment mechanism
and the measuring means were designed. A closed loop was designed to achieve the x, y, z, θx , θy of lens. Since the
assembly errors existed, the theoretical relationship between the executive mechanism, measuring means and lens
position needed to be calibrated. Ultimately we achieved about 150nm regulation accuracy of the x, y direction , 300nm
regulation accuracy of z direction ,and 0.15'' regulation accuracy of the θx, θy direction .