18 September 2014 Model and calibrating of a 5-DOF objective
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Proceedings Volume 9282, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 92821Y (2014) https://doi.org/10.1117/12.2069770
Event: 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2014), 2014, Harbin, China
Abstract
Now it’s more and more higher for the image quality of lithography systems .Due to the errors in the processing and assembly , the image quality of the traditional lens becomes lower and deviates from the theoretical value of the design. To improve image quality, it’s necessary to adjust some lens. The new objective lens having the adjustment mechanism and the measuring means were designed. A closed loop was designed to achieve the x, y, z, θx , θy of lens. Since the assembly errors existed, the theoretical relationship between the executive mechanism, measuring means and lens position needed to be calibrated. Ultimately we achieved about 150nm regulation accuracy of the x, y direction , 300nm regulation accuracy of z direction ,and 0.15'' regulation accuracy of the θx, θy direction .
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Yiguang Cheng, Lei Chen, Lixin Zhao, Song Hu, Junmin Tong, "Model and calibrating of a 5-DOF objective", Proc. SPIE 9282, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 92821Y (18 September 2014); doi: 10.1117/12.2069770; https://doi.org/10.1117/12.2069770
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