21 August 2014 Multiple spectrum analysis and evaluation for optical constants of HfO2 thin films
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Abstract
HfO2 thin films were deposited on ZS1 silica by Ion Beam Sputtering (IBS) technique. Optical constants of HfO2 thin films were obtained by multiple spectrum analysis method, which combined the transmittance spectrum and ellipsometry spectrum of the film. The refractive index and extinction coiefficient of HfO2 thin films were evaluated by etching experiments of the film. The analysis spectral range was between 250nm and 850nm.
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Dandan Liu, Dandan Liu, Huasong Liu, Huasong Liu, Chenghui Jiang, Chenghui Jiang, Yugang Jiang, Yugang Jiang, Lishuan Wang, Lishuan Wang, Zhihong Zhao, Zhihong Zhao, Yiqin Ji, Yiqin Ji, } "Multiple spectrum analysis and evaluation for optical constants of HfO2 thin films", Proc. SPIE 9283, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 92830G (21 August 2014); doi: 10.1117/12.2070046; https://doi.org/10.1117/12.2070046
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