Multiple spectrum analysis and evaluation for optical constants of HfO2 thin films

Dandan Liu; Huasong Liu; Chenghui Jiang; Yugang Jiang; Lishuan Wang; Zhihong Zhao; Yiqin Ji

doi:10.1117/12.2070046

21 August 2014 Multiple spectrum analysis and evaluation for optical constants of HfO₂ thin films

Dandan Liu, Huasong Liu, Chenghui Jiang, Yugang Jiang, Lishuan Wang, Zhihong Zhao, Yiqin Ji

Proceedings Volume 9283, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; 92830G (2014) https://doi.org/10.1117/12.2070046
Event: 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2014), 2014, Harbin, China

Abstract

HfO₂thin films were deposited on ZS1 silica by Ion Beam Sputtering (IBS) technique. Optical constants of HfO₂ thin films were obtained by multiple spectrum analysis method, which combined the transmittance spectrum and ellipsometry spectrum of the film. The refractive index and extinction coiefficient of HfO₂ thin films were evaluated by etching experiments of the film. The analysis spectral range was between 250nm and 850nm.

Citation Download Citation

Dandan Liu, Huasong Liu, Chenghui Jiang, Yugang Jiang, Lishuan Wang, Zhihong Zhao, and Yiqin Ji "Multiple spectrum analysis and evaluation for optical constants of HfO₂ thin films", Proc. SPIE 9283, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 92830G (21 August 2014); https://doi.org/10.1117/12.2070046

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