Impact of the basal material on the deposition titanium nitride thin films

Shuying Fu; Hongliang Li

doi:10.1117/12.2069017

21 August 2014 Impact of the basal material on the deposition titanium nitride thin films

Shuying Fu, Hongliang Li

Proceedings Volume 9285, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Smart Structures and Materials for Manufacturing and Testing; 928507 (2014) https://doi.org/10.1117/12.2069017
Event: 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2014), 2014, Harbin, China

Abstract

Studied by dc reactive magnetron sputtering method, with Si - p and Si (111) - p (100), two different Si do base, affect the performance of TiNx thin film preparation. Results show that Si - of the preparation of p (111) as the basal TiNx film performance is better than that of Si - p (100), the performance in the particles more renew, more Octavia and XRD diffraction fengfeng shape with TiNx diffraction peak do not overlap. Therefore, choose p - Si (111) basal deposited titanium nitride thin films, can meet the requirements of the preparation of optical thin film quality.

Citation Download Citation

Shuying Fu and Hongliang Li "Impact of the basal material on the deposition titanium nitride thin films", Proc. SPIE 9285, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Smart Structures and Materials for Manufacturing and Testing, 928507 (21 August 2014); https://doi.org/10.1117/12.2069017

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