Illumination in Microlithography

Daniel G. Smith

doi:10.1117/12.2074914

17 December 2014 Illumination in Microlithography

Daniel G. Smith

Proceedings Volume 9293, International Optical Design Conference 2014; 92931G (2014) https://doi.org/10.1117/12.2074914
Event: International Optical Design Conference, 2014, Kohala Coast, Hawaii, United States

Abstract

Illumination has been a critical factor to producing good imaging in microlithography since the beginning. Early lithographers used very simple illumination schemes, but as they improved their understanding of how the illumination influences image fidelity and resolution they moved into more complex partially coherent illumination conditions. Today, lithographers deploy many tricks with coherence and polarization that are tightly coupled with the patterns being imaged to help achieve seemingly impossible resolutions well below the classical definition. In this talk we review the progress of illumination engineering in microlithography up to the present.

Citation Download Citation

Daniel G. Smith "Illumination in Microlithography", Proc. SPIE 9293, International Optical Design Conference 2014, 92931G (17 December 2014); https://doi.org/10.1117/12.2074914

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available