Paper
20 November 2014 An investigation for the HgCdTe cleaning process
Tian-Yi Lan, Nili Wang, Shuiping Zhao, Shi-Jia Liu, Xiang-Yang Li
Author Affiliations +
Proceedings Volume 9300, International Symposium on Optoelectronic Technology and Application 2014: Infrared Technology and Applications; 93001B (2014) https://doi.org/10.1117/12.2071717
Event: International Symposium on Optoelectronic Technology and Application 2014, 2014, Beijing, China
Abstract
A new cleaning process for HgCdTe was designed,which used the improved SC-1,SC-2 and Br2- C2H5OH solutions as the main cleaning fluid and applied mega sound waves in the cleaning process. By analyzing the test results carried out on the HgCdTe surface, it was found that the material of HgCdTe for the application of new cleaning process was better than the one for the application of conventional cleaning process in the minority carrier lifetime, residual organic contamination, responsivity and specific detectivity.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tian-Yi Lan, Nili Wang, Shuiping Zhao, Shi-Jia Liu, and Xiang-Yang Li "An investigation for the HgCdTe cleaning process", Proc. SPIE 9300, International Symposium on Optoelectronic Technology and Application 2014: Infrared Technology and Applications, 93001B (20 November 2014); https://doi.org/10.1117/12.2071717
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KEYWORDS
Mercury cadmium telluride

Contamination

Natural surfaces

Semiconducting wafers

Surface finishing

Sensors

Particles

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