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16 March 2015 Modeling extreme-ultraviolet emission from laser-produced plasma using particle-in-cell method
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Abstract
A one-dimensional (1D) collisional relativistic particle-in-cell (PIC) code with ionization processes has been developed to investigate the key semiconductor manufacturing device, i.e., the extreme ultraviolet (EUV) light source from laserproduced plasmas (LPP). Unlike hydrodynamic approach, the kinetic model describes laser heating, energy transport and ultrafast electron dynamics with least approximations. The two major numerical effects of PIC simulations, i.e., numerical self-heating and numerical thermalization, are also studied and mitigated in the collisional PIC model. The integrated numerical model is achieved by simulating the dense plasma using collisional PIC model and estimating EUV emission and mean opacities according to the respective weighted oscillator strengths of tin ions with charged states varying from 5+ to 13+.
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Po-Yen Lai and Shih-Hung Chen "Modeling extreme-ultraviolet emission from laser-produced plasma using particle-in-cell method", Proc. SPIE 9357, Physics and Simulation of Optoelectronic Devices XXIII, 93570E (16 March 2015); https://doi.org/10.1117/12.2080518
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