Electrochemical deposition and characterizations of adherent NiO porous films for photovoltaic applications

Sana Koussi-Daoud; Thierry Pauporté

doi:10.1117/12.2175921

13 March 2015 Electrochemical deposition and characterizations of adherent NiO porous films for photovoltaic applications

Sana Koussi-Daoud, Thierry Pauporté

Author Affiliations +

Proceedings Volume 9364, Oxide-based Materials and Devices VI; 936425 (2015) https://doi.org/10.1117/12.2175921
Event: SPIE OPTO, 2015, San Francisco, California, United States

Abstract

We present the cathodic electrochemical preparation of NiO porous films on transparent conducting oxide substrates from nickel nitrate precursor. Two approaches are developed. The first one consists in depositing a precursor by pulsed deposition using an aqueous medium. The precursor layer is shown to be a mixture of nickel oxide and hydroxide. It is subsequently transformed into NiO by thermal annealing. We have also developed the direct electrodeposition of NiO porous layers using dimethyl sulfoxide (DMSO) organic medium and higher deposition temperature. The films have been sensitized by the P1 dye and tested as the hole transport layers for p-type dye-sensitized solar cells.

Citation Download Citation

Sana Koussi-Daoud and Thierry Pauporté "Electrochemical deposition and characterizations of adherent NiO porous films for photovoltaic applications", Proc. SPIE 9364, Oxide-based Materials and Devices VI, 936425 (13 March 2015); https://doi.org/10.1117/12.2175921

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