Inductively coupled plasmas (ICP) etching of PZT thin films for fabricating optical waveguide with photoresist/aluminum bilayer masking

Zhipeng Qi; Guohua Hu; Qin Zhu; Lixing Zhang; Manqing Li; Yiping Cui

doi:10.1117/12.2074608

27 February 2015 Inductively coupled plasmas (ICP) etching of PZT thin films for fabricating optical waveguide with photoresist/aluminum bilayer masking

Zhipeng Qi, Guohua Hu, Qin Zhu, Lixing Zhang, Manqing Li, Yiping Cui

Author Affiliations +

Proceedings Volume 9365, Integrated Optics: Devices, Materials, and Technologies XIX; 93650Z (2015) https://doi.org/10.1117/12.2074608
Event: SPIE OPTO, 2015, San Francisco, California, United States

Abstract

Waveguide morphology, as well as etched surface, is one of the most important factors deciding the performance of optical waveguide devices. In this work, we present a combination using photoresist/aluminum bilayer mask for the ICP etching of PZT (Pb(Zr1-xTix)O3) thin films. The etching results of PZT thin films with different etching methods and various etching conditions were investigated. It was found that using ICP in 30/10sccm CHF3/Ar mixture and 3Pa could help reduce the defects and contaminations on the etched surface of PZT thin films. Compared with 250W/60W dual- electrode ICP etching, a more vertical etch profile of PZT waveguide could be obtained through 100W single-electrode ICP etching under the optimal conditions.

Citation Download Citation

Zhipeng Qi, Guohua Hu, Qin Zhu, Lixing Zhang, Manqing Li, and Yiping Cui "Inductively coupled plasmas (ICP) etching of PZT thin films for fabricating optical waveguide with photoresist/aluminum bilayer masking", Proc. SPIE 9365, Integrated Optics: Devices, Materials, and Technologies XIX, 93650Z (27 February 2015); https://doi.org/10.1117/12.2074608

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