Paper
27 February 2015 Improved performance of a silicon arrayed waveguide grating by reduction of higher order mode generation near the boundary of a star coupler
Jaegyu Park, Jiho Joo, Hyundai Park, Myung-Joon Kwack, Gyungock Kim
Author Affiliations +
Proceedings Volume 9367, Silicon Photonics X; 936705 (2015) https://doi.org/10.1117/12.2077408
Event: SPIE OPTO, 2015, San Francisco, California, United States
Abstract
We investigate the improvement of an insertion loss in silicon arrayed waveguide grating (AWG), by analyzing the multimode generation due to the field-mismatching effect. 8 channel silicon AWGs on a 6” SOI wafer are fabricated with an ultra-shallow etching structure and various aperture size of arrayed WGs. Our experimental results demonstrate the improved insertion loss and crosstalk characteristics. The fabricated AWG shows an insertion loss less than 1 dB with a crosstalk of -23.2 ~ -25.6 dB, exhibiting ~2.5 dB improvement of insertion loss and ~5 dB improvement of crosstalk, compared to our reported result.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jaegyu Park, Jiho Joo, Hyundai Park, Myung-Joon Kwack, and Gyungock Kim "Improved performance of a silicon arrayed waveguide grating by reduction of higher order mode generation near the boundary of a star coupler", Proc. SPIE 9367, Silicon Photonics X, 936705 (27 February 2015); https://doi.org/10.1117/12.2077408
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Cited by 1 scholarly publication and 1 patent.
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KEYWORDS
Stars

Silicon

Etching

Waveguides

Geometrical optics

Scanning electron microscopy

Optical lithography

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